New Approach for Firing Optimization in Crystalline Silicon Cell Technology
- Topics:
- Mechanical and Industrial
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Overview: In this paper a new approach for firing optimization is introduced and demonstrated on 10 different pastes. The approach uses fewer settings and is faster than the methods traditionally used. Therefore the approach will make evaluation of new pastes and processes easier. The method uses a cross belt temperature profile to subject a cell with screen-printed paste to different temperatures while firing in the infrared furnace. J-V data, spatially resolved wafer peak temperatures and spatially resolved contact resistances using the Corescan, are used to determine settings for final optimization.
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Format: PDF | Size: 192KB | Date: Jun 2004 | Pages: 4
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