Power Systems for Reactive Sputtering of Insulating Films

Topics:
Civil and Environmental,
Mechanical and Industrial
Tags:
Advanced Energy Industries,
Productivity
Source:
Advanced Energy Industries

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Overview: Direct sputtering of insulating targets by the use of radio-frequency power, reactive sputtering using direct-current power has been frequently used because of its higher rate of deposition, and several processes and equipment configurations have been devised for this purpose. These include simple DC sputtering from a single target; single-target sputtering using DC plus an alternating voltage component?either pulsed or sinusoidal; dual-cathode sputtering using sinusoidal power, and new techniques using pulsed power and dual cathodes. This paper will describe the methods used or proposed for DC reactive sputtering and the equipment, physical principles, and operating features of each.

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Format: PDF | Size: 282KB | Date: Nov 2003 | Pages: 8

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